Photocured Zwitterionic Coatings Containing POSS for Antifogging Applications

The conventional fabrication of antifogging polymer coatings such as zwitterionic or amphiphilic copolymers typically require multiple processes. In this work, a simple photocuring method was used to create series containing polyhedral oligomeric silsesquioxane (POSS) without the need prepare copolymer. Surface analysis demonstrated that coating thickness about 6 μm, and surface POSS content showed tendency increasing with POSS. A wettability high held better water absorbing capability than low Furthermore, it found proportion contributed towards enhancement transmittance. excellent properties mass fraction can be ascribed aforementioned good It is expected via incorporation utilized for practical application.